Non-photosensitive

Fujifilm has several non-photosensitive polyimide formulations for a wide variety of semiconductor and related applications.

  • Final coating thicknesses from 400 Angstroms to 25 microns
  • Low temperature cure options
  • Very low shrinkage
  • Patternable using laser direct or etch methods
  • NMP free
  • Durimide® 20 Series: Fully imidized polyimide used primarily as a thin lift-off layer. Durimide 20 is stable at room temperature. Final thicknesses from 400 Angstroms to 3 microns possible.
  • LTG 12-52: Low temperature glue designed for die and component attach applications.Final thicknesses from 5 to 25 microns.

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