Post CMP Cleaners

FUJIFILM Electronic Materials Post CMP slurries are designed to clean particles, trace metal and organic residues while protecting the metal surface.

Market-leading cleaner are available to meet a broad range process and technology requirements.

FUJIFILM Electronic Materials Post CMP cleaners feature:

  • Efficient particle removal
  • Excellent organic cleanability
  • Outstanding corrosion protection for sensitive metal features
  • Attractive cost of ownership – Concentrated cleaners provide lower cost at point-of-use

Available Copper Cleaner:

Clean-100

Contact Us for more information and a complete product overview