Copper CMP Slurries

FUJIFILM Electronic Materials copper CMP slurries feature:

• High removal rates, high planarization efficiency, low topography, low defectivity, and excellent over polish margins
• Tunable formulations – with independent component knobs for customer’s specific performance targets
• High selectivity to common barrier films resulting in easy end-point detection and good Cu residual clearing without compromising topography
• Strong Prestonian behavior in Cu polishing for easy process development and control
• Low cost of ownership due to highly concentrated formulations
• Ease of use – Special cleaning chemistries or process conditions are not required

Available Copper CMP Slurries:

• CSL9044C
  • Developed for a wide variety of devices including leading edge circuits
  • Well proven and established product in Cu applications
  • Provides high removal rates to maximize process throughput
  • High selectivity to barrier films
  • Low defectivity
  • Excellent copper clearing capability
  • High planarization efficiency
  • Low dishing and erosion
  • Robust process can be developed for a great range of applications from mature technology nodes to the most advanced nodes including thick metal layers
• CSL9400C
  • Developed for leading edge circuits
  • Higher removal rates to maximize process throughput and reduce Cu polish to 1 platen
  • Excellent selectivity to barrier films
  • Significantly low defectivity
  • Excellent copper clearing capability
  • Low but tunable dishing and erosion
  • Suitable for a range of technology nodes including logic, memory or thick metal polishing
• CSL9500C
  • Developed for leading edge circuits including Ruthenium liner integrations
  • Provides high removal rates to maximize process throughput
  • Excellent selectivity to barrier films
  • Ultra low defectivity
  • Excellent copper clearing capability
  • Low but tunable dishing and erosion
  • Suitable for the most advanced integration applications
• CSL9215C
  • Developed for very thick metal applications
  • Ultra removal rates to maximize process throughput for TSV Copper removal
  • Excellent selectivity to barrier films
  • Low defectivity
  • Excellent copper clearing capability
  • Topography following copper clear meets TSV requirements

Contact Us for more information

FUJIFILM Electronic Materials copper slurries are designed for first generation copper interconnects through the latest leading edge technologies

• Barrier CMP Slurries
• Emerging Metal Slurries
• Front End CMP Slurries
• Post CMP Cleaners