Discover FUJIFILM’S Extensive Product Portfolio
across the semiconductor manufacturing chain

PATTERN & ETCH
A wide range of advanced photoresist products and ancillaries, complimented with etchants.

Photoresists Edge Bead Removers Developers Etchants

REMOVAL
A comprehensive range of cleaners to remove etch residues and strippers to remove bulk photoresist

Cleaners Strippers

CMP
Chemical Mechanical Planarization (CMP) is a critical process in the fabrication of microchips

Copper CMP Slurries TSV CMP Slurries Barrier CMP Slurries Other CMP Slurries

DEPOSIT LAYER
Chemical Vapor Deposition (CVD) for dielectrics

Advanced low K Gap fill & recovery Dielectric Dielectric dopants Delivery equipment

MODIFY ELECTRICAL PROPERTIES
Silicon dopants to create p+ or n- regions

Dopants Delivery equipment

PROTECTIVE COATING & RDL
Specialty stress relief coatings used as protective layer (buffer coat) and/or Re-Distribution Layer (RDL)

Photosensitive - aqueous developable Photosensitive - solvent developable Non-photosensitive