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PATTERN & ETCH
A wide range of advanced photoresist products and ancillaries, complimented with etchants.
A comprehensive range of cleaners to remove etch residues and strippers to remove bulk photoresist
Chemical Mechanical Planarization (CMP) is a critical process in the fabrication of microchips
Chemical Vapor Deposition (CVD) for dielectrics
MODIFY ELECTRICAL PROPERTIES
Silicon dopants to create p+ or n- regions
PROTECTIVE COATING & RDL
Specialty stress relief coatings used as protective layer (buffer coat) and/or Re-Distribution Layer (RDL)