e-Beam

Positive and negative tone resist series for a wide array of e-beam imaging applications.

  • Superior resolution
  • Wide process windows
  • FEP series
    The FEP series of products are suited to work with a wide array of applications requiring positive tone imaging with e-beam exposure.
  • FEN series
    The FEN series of products are suited to work with a wide array of applications requiring negative tone imaging with e-beam exposure.

Contact Us for more information and a complete product overview