e-Beam
Positive and negative tone resist series for a wide array of e-beam imaging applications.
- Superior resolution
- Wide process windows
- FEP series
The FEP series of products are suited to work with a wide array of applications requiring positive tone imaging with e-beam exposure. - FEN series
The FEN series of products are suited to work with a wide array of applications requiring negative tone imaging with e-beam exposure.
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