Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications
|Resolution||20 µm line|
|Transmittance||Extremely low through 300-1200nm|
|Reflectance||Quite Low through 300-700nm|
|Environment||EHS approved raw materials|
|Packaging options :||
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Black material series of COLOR MOSAIC® are negative tone imaging materials. These non-carbon high optical density (O.D) type materials have high shielding performance which is very useful for various light blocking applications.