FUJIFILM Planar Solutions Front End CMP slurries are designed for devices that utilize advanced transistor technologies such as high-K metal gates, advanced dielectrics, 3-dimensional FinFET transistors, and self-aligned contacts. Various product platforms are available to meet a broad range of process and technology requirements.
FUJIFILM Planar Solutions Front End CMP slurries feature:
Available Front End Barrier CMP Slurries:
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FUJIFILM Planar Solutions advanced Front End CMP slurries are designed for use in the critical early stages of device fabrication, removing materials in in a controlled manner to provide the ideal surface for subsequent steps in the production flow.